Genitech, Inc. was founded in 1996 by the researchers formerly with  Electronics & Telecommunications Research Institute (ETRI), located in  Daedok Valley, Daejon Korea. The founders of Genitech, Inc. have extensive  experiences in semiconductor processes including device designs and equipment.  In fact, they did vital roles during the early phases of development of  CMOS-technology-based 4M DRAM designs and processes as a government-sponsored  project at ETRI, which is recognized to be the major contributing factors to  the enormously successful and flourishing DRAM industry today in Korea.  Genitech's primary goal is to develop semiconductor process technologies for  the next generation semiconductor manufacturing and beyond.  Genitech's staff members consist of engineers and scientists with Ph.D. and  master's degree in physics, chemistry, materials science, electrical engineering,  chemical engineering, and mechanical engineering.  Since its inception in 1996, Genitech has been developing advanced technologies  in the following three major area.  Plasma enhanced atomic layer deposition (PEALD) tool which solves the limitations  of current generation ALD tool.  Superfill CVD for Cu interconnection which enables dry process of Cu deposition  known to be possible only by wet electroplating.  A unique and highly accurate chemical mechanical polishing (CMP) tool, UNIPLA CMP?  Genitech signed a joint development agreement with ASM International in October 2001.