Planar Alloy Sputtering Target

Planar Alloy Sputtering Target

Price:
USD 1.00 - 10.00

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Supplier Details

Fujian Acetron New Materials CO. , Ltd

Free Member  (2024)

[ Fuzhou, FU,China ]

Business Type:  Manufacturer

Supplier has 5 products

Contact Details

Product Description

Planar Alloy Sputtering Target
Excellent properties such as high purity, high density, Good composition uniformity, Uniform grain, etc.
High purity: The metal target requires very high purity, to ensure the stability and reliability of the material.We have various purity levels to suit your specific requirements, with the minimum purity of 99.5% up to 99.9999% for some metals. Also have controlled specific impurities within the target
High density: Metal targets have high density characteristics, usually up to 99%, to ensure the stability and quality of materials.
Uniform grain: Controlled grain size and direction
Good composition uniformity: the component distribution is uniform, ensure the film formation rate is uniform, film quality.

Maximum sizes of planar target    
Thickness: 30mm can be 60mm for round target    
Width: max 2000mm    
Length: max 4000mm    

Maximum sizes of rotary target    
Vacuum/Air Spraying    
Backing tubes: ID56 x OD64 x Length3003000mm, Thickness: 35mm    
Backing tubes: ID7883 x OD8992 x Length3003000mm, Thickness: 37mm    
Backing tubes: ID100 x OD108 x Length3003000mm, Thickness: 38mm    
Backing tubes: ID125 x OD133 x Length3004000mm, Thickness: 313mm    

Bonding    
Backing tubes: ID125 x OD133 x Length5004000mm, Thickness: 813mm    
Planar/Rotary target can be customised as per your request.    
Chemical Formula Purity Forms Specification
Si Al 99.9% / 99.99% Planar / Rotary Customized
Ni Cr 99.8% / 99.99% Planar Customized
Ti Al 99.6% / 99.9% Planar Customized
Al Sc 99.99% Planar Customized
In Sn 99.99% Planar Customized
Al Alloy 99.99% / 99.999% / 99.9995% Planar Customized
Ag Alloy 99.99% / 99.995% Planar Customized
Au Alloy 99.99% / 99.999% Planar Customized
Cu Alloy 99.99% / 99.999% Planar Customized
Mo Alloy 99.95% Planar Customized
Ni Alloy 99.99% Planar Customized
Si Alloy 99.99% Planar / Rotary Customized
Alloy sputtering targets play a crucial role in thin film deposition processes, enabling the fabrication of coatings with specific properties tailored to the requirements of diverse applications in industries such as electronics, optics, and coatings.If you need any information or a quote please contact us, you can contact our sales team directly or fill out the form below and we will get back to you in time.

Basic Information

Country:
China
Business Type:
Manufacturer
Year Established:
Total Employees:
101 - 500

About Us

Fujian Acetron New Materials Co., Ltd, founded in 2002, is a comprehensive company integrated with R D, manufacturing and selling of PVD coating materials, mainly engages in sputtering target, evaporation material and evaporation accessories for high precision optical lenses Optical communication, semiconductors, LOW-E glass Automotive glass, LCD display touch panel and surface decoration.

Member History

Year Joined:
2024
Membership Type:
Free Member

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