Rotary Ceramic Sputtering Target
Supplier Details
Fujian Acetron New Materials CO. , Ltd
Free Member (2024)
[ Fuzhou, FU,China ]
Business Type: Manufacturer
Supplier has 5 products
Product Description
Rotary Ceramic Sputtering Target
Excellent properties such as high purity, high density,Good microstructure uniformity, excellent electrical properties.
High purity: The metal target requires very high purity, to ensure the stability and reliability of the material.We have various purity levels to suit your specific requirements, with the minimum purity of 99.5% up to 99.9999% for some metals. Also have controlled specific impurities within the target.
High density: Metal targets have high density characteristics, usually up to 95-99.5%,?ITO,NbOx can reach 99.5% to ensure the stability and quality of materials.
High thermal conductivity: the thermal conductivity of the metal target is particularly high, which can be cooled quickly and improve the coating speed.
Microstructure uniformity: powder metallurgy process to ensure the overall uniformity of the target.
Excellent electrical properties: Reliable atmosphere sintering enables stable electrical conductivity of oxides with semiconductor characteristics.
Maximum sizes of planar target
Thickness: 30mm can be 60mm for round target
Width: max 2000mm
Length: max 4000mm
Maximum sizes of rotary target
Vacuum/Air Spraying
Backing tubes: ID56 x OD64 x Length3003000mm, Thickness: 35mm
Backing tubes: ID7883 x OD8992 x Length3003000mm, Thickness: 37mm
Backing tubes: ID100 x OD108 x Length3003000mm, Thickness: 38mm
Backing tubes: ID125 x OD133 x Length3004000mm, Thickness: 313mm
Bonding
Backing tubes: ID125 x OD133 x Length5004000mm, Thickness: 813mm
Planar/Rotary target can be customised as per your request.
Chemical Formula Purity Forms Specification
SiO? 99.995% Planar Customized
Nb?Ox 99.99% Planar / Rotary Customized
TiOx 99.99% Planar / Rotary Customized
ITO Target In?O? SnO? 99.99% Planar / Rotary Customized
AZO Target ZnO Al?O? 99.99% Planar / Rotary Customized
IGZO TargetIn?O? Ga?O? ZnO 99.99% Planar / Rotary Customized
Sputtering coating refers to the technology that the ions produced by the ion source are accelerated to gather in the vacuum to form a high speed ion beam, which bombards the solid surface, and the kinetic energy exchange between the ions and the solid surface atoms makes the atoms on the solid surface leave the solid and deposit on the surface of the substrate material. The bombarded solid is the raw material for deposition of thin film materials by sputtering method, which is called the sputtering target.If you need any information or a quote please contact us, you can contact our sales team directly or fill out the form below and we will get back to you in time.
Basic Information
Country:
China
Business Type:
Manufacturer
Year Established:
Total Employees:
101 - 500
About Us
Fujian Acetron New Materials Co., Ltd, founded in 2002, is a comprehensive company integrated with R D, manufacturing and selling of PVD coating materials, mainly engages in sputtering target, evaporation material and evaporation accessories for high precision optical lenses Optical communication, semiconductors, LOW-E glass Automotive glass, LCD display touch panel and surface decoration.
Member History
Year Joined:
2024
Membership Type:
Free Member
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